[23p-B205-1~5] 13.2 Exploratory Materials, Physical Properties, Devices

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation AwardHighlighted Presentation

[23p-B205-1] Formation of SiH from CaSi₂ films fabricated by close-spaced evaporation

〇Ryota Takagaki¹, Keisuke Arimoto¹, Junji Yamanaka¹, Masashi Kurosawa², Kosuke Hara¹ (1.Univ. of Yamanashi, 2.Nagoya Univ.)

Keywords:

layered material,Silicane