[16a-B1-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[16a-B1-1] Wafer loading and wafer transfer system under vacuum in Minimal Fab

〇Shiro Hara^1,2,3, Shuichi Noda¹, Hitoshi Maekawa¹ (1.AIST, 2.MINIMAL, 3.Hundred Semi)

Keywords:

Minimal Fab,Low-volume wide-variety,Wafer Transfer under vacuum

Minimal Fab is an ultra-compact semiconductor manufacturing system. Owing to the development of local-clean wafer transport technology, Minimal Fab will be the first in the world to be able to transport wafers in a gas-blocking or vacuum atmosphere in principle. The wafer transport container and wafer load port are already vacuum compatible. In this presentation, we will present the details of this advanced system.