[16a-C31-1~10] 6.4 Thin films and New materials

11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[16a-C31-10] In-situ observation of internal stress during sputter-deposition of films on high temperature substrate

〇Shigeki Nakagawa¹, Ryo Yokozawa¹, Daisuke Iida¹, Yasunobu Sasaki¹, Yota Takamura¹, Yutaka Nakamitsu², Takehito Jinbo² (1.Tokyo Tech, 2.ULVAC)

Keywords:

internal stress,film formation,in-situ observation

It is possible to obtain information of structural changes in the early stages of film growth by in-situ observation of internal stress of the films during sputter-deposition. Observation of the internal stress changes of W thin films deposited at different substrate temperatures clarified many attractive features corresponding to the formation of the film growth. The film thickness corresponding to the transition point from the island structure to the continuous film formation did not differ significantly with the substrate temperature, being about 4 nm. On the contrary, both the tensile stress generated in the early stages of film deposition and the increase in the compressive stress, appeared after the film becomes continuous film, shows significantly different dependence on the film thickness for the films deposited at different substrate temperature.