Session Details

[16a-C31-1~10]6.4 Thin films and New materials

Mon. Sep 16, 2024 9:00 AM - 11:30 AM JST
Mon. Sep 16, 2024 12:00 AM - 2:30 AM UTC
C31 (Hotel Nikko 3F)
Masami Nishikawa(Nagaoka Univ. of Tech.)

[16a-C31-1]Evaluation of the silicon-based low-permittivity dielectric films using universal machine learning potential

〇Akira Notake1, Takuro Tsutsui1, Tsuyoshi Moriya1, Hitomi Oigawa1, Lei Feng1, Zeyuan Ni2, Taiki Kato2, Tomohisa Ogawa2, Masaaki Matsukuma2, Hisashi Higuchi2, Atsushi Kubo2, Ken Okoshi2, Yohei Matsuyama2, Hiroki Murakami2, Yamato Tonegawa2 (1.Tokyo Electron Ltd., 2.Tokyo Electron Technology Solutions Ltd.)

[16a-C31-2]Multilayer with Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (3)

〇(D)Naoya Tajima1, Hiroshi Murotani1, Takayuki Matsudaira2 (1.Tokai Univ., 2.SHINCRON CO.LTD.)

[16a-C31-3]DSSC with heat-resistant ITO transparent conducting films

〇Naohiro Nomura1, Go Okuma1, Masayuki Okuya1 (1.Shizuoka Univ.)

[16a-C31-4]Electric field induced luminescence intensity variation of vanadium oxide phosphors

〇Tomohiko Nakajima1, Yuuki Kitanaka1 (1.AIST)

[16a-C31-5]Evaluation Optical and Thermal Properties of α-phase MnTe Thin Film

〇Masashi Kuwahara1, Mihyeon Kim2, Shunsuke Mori2, Yi Shuang2, Yuji Sutou2, Hitoshi Kawashima1, Hiroyuki Tsuda3 (1.AIST, 2.Tohoku Univ., 3.Keio Univ.)

[16a-C31-6]Changes in magnetic property of Cr-incorporated MnTe film

〇Mihyeon Kim1, Yi Shuang2, Ryoga Nakajima3, Takashi Harumoto3, Daisuke Ando1, Yuta Saito1, Yuji Sutou1,2 (1.Sch. of Eng., Tohoku Univ., 2.WPI-AIMR, Tohoku Univ., 3.Dept. of MSE, Tokyo Inst. of Technology)

[16a-C31-7]High-temperature spin cluster glass behaviors in Fe3-xTixO4 spinel ferrite thin films

〇Hiroyasu Yamahara1, Siyi Tang1, Haining Li1, Md Shamim Sarker1, Ahamed E M K Ikball1, Sonju Kou1, Tetsuya Fukushima2, Munetoshi Seki1, Hitoshi Tabata1 (1.Univ. of Tokyo, 2.AIST)

[16a-C31-8]Synthesis of ilmenite NaCo1/3Sb2/3O3 thin film with cobalt honeycomb lattice

〇Haobo Li1, Shunsuke Kobayashi2, Chengchao Zhong3, Kousuke Ooe2, Weitao Yan4, Wei-Hua Wang4, Hattori Azusa1, Hiroshi Takatsu5, Hiroshi Kageyama5, Hidekazu Tanaka1 (1.Osaka Univ., 2.JFCC, 3.Ritsumeikan Univ., 4.Nankai Univ., 5.Kyoto Univ.)

[16a-C31-9]Formation factor of the lattice strain in VO2/TiO2(001)

〇Yuji Muraoka1, Reki Nakamoto2, HIroyuki Okazaki3, Takanori Wakita1, Takayoshi Yokoya1 (1.Okayama Univ. RIIS, 2.Okayama Univ. Grad. Sch., 3.QST)

[16a-C31-10]In-situ observation of internal stress during sputter-deposition of films on high temperature substrate

〇Shigeki Nakagawa1, Ryo Yokozawa1, Daisuke Iida1, Yasunobu Sasaki1, Yota Takamura1, Yutaka Nakamitsu2, Takehito Jinbo2 (1.Tokyo Tech, 2.ULVAC)