Presentation Information
[16p-A22-10]Proposal of atmospheric pressure activation process for Mg-ion implanted GaN using OVPE method
〇Shigeyoshi Usami1, Yuta Ito2, Miyuki Kagawa1, Sogo Yokoi1, Atsushi Tanaka3, Junichi Takino4, Tomoaki Sumi4, Masayuki Imanishi1, Ryota Ito5, Masahiko Hata6, Masashi Yoshimura7, Yoshio Okayama4, Yoshio Honda3, Hiroshi Amano3, Yusuke Mori1 (1.Osaka Univ., 2.Nagoya Univ., 3.IMaSS Nagoya Univ., 4.Panasonic Holdings Corp., 5.Sumitomo Chemical Co., Ltd., 6.Itochu Plastics Inc., 7.ILE Osaka Univ.)
Keywords:
OVPE method,GaN,Mg-ion implantation
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