Presentation Information
[16p-B1-7]µCLS (001) Single Crystal MOSFET Fabricated by All Sputter Processes
〇(M1)Ryota Nosu1, Wenchang Yeh1 (1.Shimane Univ.)
Keywords:
transistor,single crystal,silicon
We have proposed the micro-chevron laser scanning (μCLS) method and demonstrated that it is possible to grow grain-free single-crystal Si stripes on SiO2 and fabricate MOSFET with a mobility equivalent to single-crystal Si.
However, the random crystalline orientation caused variations in the characteristics.
In this study, we realized (001) single-crystal Si stripes MOSFET by the μCLS method of sputtered Si films and evaluated the characteristics and variations.
However, the random crystalline orientation caused variations in the characteristics.
In this study, we realized (001) single-crystal Si stripes MOSFET by the μCLS method of sputtered Si films and evaluated the characteristics and variations.
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