[16p-P02-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[16p-P02-10] Adhesion of coated copper films on PTFE surfaces irradiated with a CH₃⁺ ion beam

〇(M1C)Toshihiro Yokogawa¹, Ichiro Takano² (1.Grad School, Kogakuin Univ., 2.Kogakuin Univ.)

Keywords:

Surface Modification,PTFE,Ion Beam

In recent years, the development of high-frequency circuit boards for post-5G has required substrates with low transmission loss. PTFE has attracted attention as a substrate with low transmission loss, but PTFE has high releasability, so surface modification is required. In this study, as a method of surface modification, the hydrophobic "F" was removed from the PTFE surface by irradiating it with a CH₃⁺
ion beam, and the adhesion was improved because the surface roughness increased as a result of the increase in electrical resistivity.