[17a-B2-1~9] 15.7 Crystal characterization, impurities and crystal defects

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[17a-B2-7] Fe gettering behavior of SiH_x and C₂H_y mixture molecular-ion-implanted silicon epitaxial wafer (2)

〇Ryo Hirose¹, Ayumi Masada¹, Takeshi Kadono¹, Koji Kobayashi¹, Akihiro Suzuki¹, Sho Nagatomo¹, Kazunari Kurita¹ (1.SUMCO CORPORATION)

Keywords:

silicon wafer,gettering,CMOS image sensor