Presentation Information

[17a-P01-62]Floating gate FET based on MoS2 with a TaOx/TaS2 heterostructure

〇(M1)YUTARO SAHASHI1, MITSURU INADA1, SHINGO SATO1, KEIJI UENO2, MAHITO YAMAMOTO1 (1.Kansai Univ, 2.Saitama Univ)

Keywords:

2D material,Floating gate FET,TaS2

We fabricated a floating gate FET based on a MoS2 channel, a TaS2 floating gate, and a TaOx tunnel barrier that was created by the surface O3 oxidation of TaS2.

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