[17p-D62-1~9] 7.3 Micro/Nano patterning and fabrication

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[17p-D62-1] Evaluation of EUV mask absorber durability to high-power EUV irradiation

〇Hayato Ishida¹, Testuo Harada¹, Shinji Yamakawa¹ (1.LASTI Univ. of Hyogo)

Keywords:

EUV lithography,Blister,EUV induced hydrogen plasma