The 85th JSAP Autumn Meeting 2024
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Session Details

Oral presentation7 Beam Technology and Nanofabrication : 7.3 Micro/Nano patterning and fabrication

[17p-D62-1~9]7.3 Micro/Nano patterning and fabrication

Tue. Sep 17, 2024 1:30 PM - 4:00 PM JST
Tue. Sep 17, 2024 4:30 AM - 7:00 AM UTC
D62 (Bandaijima Bldg)
Jiro Yamamoto(Hitachi), Noriyuki Unno(Tokyo University of Science)
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1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[17p-D62-1]Evaluation of EUV mask absorber durability to high-power EUV irradiation

〇Hayato Ishida1, Testuo Harada1, Shinji Yamakawa1 (1.LASTI Univ. of Hyogo)
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1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-D62-2]EUV contrast curve measurement of the main chain scission type resists

〇(M1)Ryuta Shiga1, Shinji Yamakawa1, Tetsuo Harada1 (1.Univ. of Hyogo)
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2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-D62-3]Study of the aggregation structure influence in EUV resist sensitivity.

〇Yuri Ebuchi1, Ryuta Shiga1, Shinji Yamakawa1, Tetsuo Harada1 (1.Univ. of Hyogo)
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2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[17p-D62-4]Cross-linking of PDMS by irradiation of soft X-rays and dependence of
X-ray energy

〇SEIKO NAKAGAWA1, MAKI OHARA2, AKINARI YOKOYA2, NORIKO USAMI3 (1.TIRI, 2.QST, 3.KEK)
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2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[17p-D62-5]Fundamental Study on Lithographic Characteristics of Organic-Inorganic Hybrid Resists for EUV Lithography

〇Hiroki Yamamoto1, Yuko (Tsutsui) Ito2, Kazumasa Okamoto2, Takahiro Kozawa2 (1.QST, 2.SANKEN, Osaka Univ.)
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3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-D62-6]Technology Transition Characteristics of Advanced Photoresist from IP Information

〇Kosuke Watahiki1, Yoshihiro Midoh2, Kazuya Okamoto1,2,3 (1.Yamaguchi Univ., 2.Osaka Univ., 3.Nippon Inst. of Technology)
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3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[17p-D62-7]Slanted mold fabrication by electron beam lithography and replication with fabricated mold

〇(M1)Naoya Shibasaki1, Unno Noriyuki1, Taniguchi Jun1 (1.Tokyo Univ. of Sci.)
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3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-D62-8]Hybrid soft replica mold for fine Ag wiring without a residual layer

〇Yuri Nakamura1, Jun Taniguchi1 (1.Tokyo Univ. of Sci.)
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3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[17p-D62-9]Stereophonic Lithography Using Paraboloid Mirrors and a Compensated Flat Reticle

〇Toshiyuki Horiuchi1, Jun-ya Iwasaki1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)
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