[17p-D62-1~9] 7.3 Micro/Nano patterning and fabrication

2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[17p-D62-3] Study of the aggregation structure influence in EUV resist sensitivity.

〇Yuri Ebuchi¹, Ryuta Shiga¹, Shinji Yamakawa¹, Tetsuo Harada¹ (1.Univ. of Hyogo)

Keywords:

EUVL,Resist,X-ray scattering