[17p-D62-1~9] 7.3 Micro/Nano patterning and fabrication

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[17p-D62-7] Slanted mold fabrication by electron beam lithography and replication with fabricated mold

〇(M1)Naoya Shibasaki¹, Unno Noriyuki¹, Taniguchi Jun¹ (1.Tokyo Univ. of Sci.)

Keywords:

Photo Lithography,Electron Beam Lithography

Head-mounted displays such as AR and VR are next-generation interactive displays that use 3D images. Surface-relief diffraction gratings are used in these devices. The fabrication method requires photolithography followed by reactive ion etching. The sample was slanted and patterned by electron beam lithography to obtain a single-step process, and then transferred by UV nanoimprint lithography using it as a mold.