[17p-D62-1~9] 7.3 Micro/Nano patterning and fabrication

3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[17p-D62-9] Stereophonic Lithography Using Paraboloid Mirrors and a Compensated Flat Reticle

〇Toshiyuki Horiuchi¹, Jun-ya Iwasaki¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

Keywords:

stereophonic projection lithography,paraboloid mirrors,flat reticle

Stereophonic lithography for printing large patterns with widths between several tens and hundreds microns on arbitrary but gently curved surfaces has been researched using a pair of paraboloid mirrors. Here, a new method using a flat reticle with original patterns compensated the distortion errors caused by the specimen surface curvature in addition to the paraboloid mirror optics. At first, pattern distortions projected on the curved concave surfaces of specimen spoons were calculated, and compared with the actually printed resist patterns by using a reticle with patterns compensated the distortions caused by the paraboloid mirror optics. As a result, the calculated pattern shapes almost coincided with the actually printed resist pattern shapes. For this reason, the reticle was modified so as the printed pattern shapes became square lattices with aimed sizes, next. Thus, it was demonstrated that printing of patterns with aimed shapes and sizes were capable using a conventional flat reticle and without using a curved reticle. Anticipated distortions were almost modified.