[18a-A31-1~11] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[18a-A31-6] Effects of Substrate Types on BN Films Prepared Using EBEP CVD Method

〇Toru Harigai¹, Kenichi Inoue², Seigo Takashima¹, Hiroyuki Kousaka¹, Kenji Ishikawa², Masaru Hori² (1.Gifu Univ., 2.Nagoya Univ. cLPS)

Keywords:

electron beam excited plasma,bron nitride film,plasma CVD