[18a-A31-1~11] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18a-A31-8] Speed Control of Circular Orbit Motion of Cathode spot in Vacuum Arc Deposition for AlCrN Film Formation

〇Mirano Oneda¹, Seiya Watanabe¹, Genki Sano¹, Hirofumi Takikawa¹, Hiroaki Sugita², Takahiro Hattori², Hiroki Gima² (1.Toyohashi Univ. Technol., 2.OSG Co., Ltd.)

Keywords:

steering arc,AlCrN,vacuum arc deposition

In order to fabricate droplet-free AlCrN films, the stead (Steering Arc) method is used to reduce droplets by preventing overheating of the cathode by rotating the cathode point on the cathode at high speed. In this study, discharge tests were conducted by changing the magnetic field configuration in order to increase the speed of cathode rotation. It was confirmed that the speed of the cathode point circling on the cathode changed by changing the magnetic field configuration.