[18p-A22-1~21] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

5:15 PM - 5:30 PM JST(8:15 AM - 8:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18p-A22-14] Evaluation of Sources for Mist Chemical Vapor Deposition of Nb-doped TiO₂ Conducting Films

〇Ayaka Nakamura¹, Megumi Ariga¹, Rento Naito¹, Tomohito Sudare², Ryo Nakayama², Ryota Shimizu², Kentaro Kaneko³, Taro Hitosugi², Naoomi Yamada¹ (1.Chubu Univ., 2.Univ. Tokyo, 3.Ritsumeikan Univ.)

Keywords:

highly conducting anatase TiO2,mist chemical vapor deposition,protection layer for separator in fuel cells