[18p-A22-1~21] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

7:00 PM - 7:15 PM JST(10:00 AM - 10:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18p-A22-20] Microwave remote plasma enhanced atomic layer deposition for In₂O₃ thin film

〇Yuuto Kawato¹, Takanori Takahashi¹, Toshihiro Tamai², Shunichi Mikami², Yukiharu Uraoka¹ (1.NAIST, 2.HORIBA STEC)

Keywords:

atomic layer deposition,plasma enhanced atomic layer deposition,oxide semiconductor