[18p-A23-1~17] Fundamentals and Latest Technology Trends of Atomic Layer Process (ALP)

6:00 PM - 6:30 PM JST(9:00 AM - 9:30 AM UTC)

[18p-A23-13] Highly-Selective Co Thin Film Formation Process Utilizing Combined ALD and ALE

〇Jun Yamaguchi¹, Noboru Sato¹, Atsuhiro Tsukune¹, Takeshi Momose¹, Yukihiro Shimogaki¹ (1.The Univ. Tokyo)

Keywords:

atomic layer deposition,ALD,selective deposition