[18p-A23-1~17] Fundamentals and Latest Technology Trends of Atomic Layer Process (ALP)

3:45 PM - 4:15 PM JST(6:45 AM - 7:15 AM UTC)

[18p-A23-7] Surface Reactions in Atomic layer Etching Processing

〇Kazuhiro Karahashi¹, Tomoko Ito¹, Satoshi Hamaguchi¹ (1.Osaka Univ.)

Keywords:

etching,surface reaction,semiconductor