[18p-A23-1~17] Fundamentals and Latest Technology Trends of Atomic Layer Process (ALP)

4:30 PM - 5:00 PM JST(7:30 AM - 8:00 AM UTC)

[18p-A23-9] Atomic layer etching of dielectric films using HF containing plasma at low temperature

〇Makoto Sekine¹ (1.Nagoya Univ.)

Keywords:

plasma etching,atomic layer process