[18p-A31-1~19] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:30 PM - 4:45 PM JST(7:30 AM - 7:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18p-A31-12] Ruthenium (Ru) etching by energetic oxygen and chlorine ions

〇(M1)Takuma Yanagisawa¹, Tomoko Ito¹, Masaya Imai², Katsuya Miura², Miyako Matsui², Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (1.Osaka Univ., 2.R&D Group, Hitachi Ltd.)

Keywords:

ruthenium,oxygen ion,chlorine ion