[18p-A31-1~19] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:45 PM - 6:00 PM JST(8:45 AM - 9:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18p-A31-17] RF bias dependence on low temperature etching of SiO₂ by CF₄/H₂ plasma

〇Yusuke Imai¹, Shih-Nan Hsiao², Makoto Sekine², Takayoshi Tsutsumi², Kenji Ishikawa², Masaru Hori² (1.Nagoya U. Eng., 2.Center for Low-temperature Plasma Science)

Keywords:

Plasma,Low-temperature etching,Surface analysis