[18p-A32-20~20] 8.6 Plasma Electronics English Session

6:45 PM - 7:00 PM JST(9:45 AM - 10:00 AM UTC)English Presentation

[18p-A32-20] Investigation of Metal-Organic Plasma Enhanced Chemical Vapor Deposition for Yttrium Oxide film using a Microwave Excited Atmospheric Pressure Plasma Jet

〇(DC)Bat-Orgil Erdenezaya¹, Hirochika Uratani¹, Ruka Yazawa¹, Md. Shahiduzzaman¹, Tetsuya Taima¹, Yusuke Nakano¹, Yasunori Tanaka¹, Tatsuo Ishijima¹ (1.Kanazawa University)

Keywords:

Y2O3,PE-MOCVD