[18p-A32-20~20] 8.6 Plasma Electronics English Session

18:45 〜 19:00英語発表

[18p-A32-20] Investigation of Metal-Organic Plasma Enhanced Chemical Vapor Deposition for Yttrium Oxide film using a Microwave Excited Atmospheric Pressure Plasma Jet

〇(DC)Bat-Orgil Erdenezaya¹, Hirochika Uratani¹, Ruka Yazawa¹, Md. Shahiduzzaman¹, Tetsuya Taima¹, Yusuke Nakano¹, Yasunori Tanaka¹, Tatsuo Ishijima¹ (1.Kanazawa University)

キーワード：

Y2O3、PE-MOCVD