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[18p-B1-16]Reducing bonding resistance between dissimilar semiconductor substrates using RTWB

〇Shuntaro Fujii1, Reo Aoyama1, Yuta Nishidate1, Moeka Chiba1, Shuto Fujiwara1, Keigo Saito1, Ryuga Kikuchi1, Kosuke Watanabe1, Kouichi Akahane2, Shiro Uchida1 (1.Chiba Inst., 2.NICT)
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Keywords:

compound solar cell

In this experiment, dissimilar semiconductor substrates with an ohmic electrode were used to achieve the target value for practical use, the junction interface resistance ρc ≤ 10-2 Ωcm2. The junction experiment was performed with the applied voltage of fast atom beam irradiation as a parameter. As a result, the J-V characteristics of p-InGaAs // n-GaAs were close to ohmic contact. This is because the surface flatness was improved by lowering the applied voltage.

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