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[18p-P09-27]Preparation Conditions of CsFA Perovskite Layer by Anti-Solvent-Free Method Using a Spin Coater Equipped with Semi-Automatic Micropipette and Radiation Heater

〇Kazuki Niita1, Tomoyuki Tobe1,4, Ryoto Funayama3, Naoyuki Shibayama2, Masashi Ikegami1, Tsutomu Miyasaka2 (1.Graduate School of Engineering, Toin University of Yokohama, 2.Faculty of Biomedical Engineering, Toin University of Yokohama, 3.Kishu Giken Kogyo, Co. Ltd., 4.KISTEC)
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Keywords:

perovskite,spin coating,anti-solvent-free coating

In the preparation of perovskite layers using a spin coater, after spreading the precursor solution on the substrate, chlorobenzene as an anti-solvent is dripped onto the rotating substrate. Following the completion of the spin coating process, the substrate is transferred from the spin coater's stage to a hotplate for heat treatment. There is a time lag during the transfer from the spin coater stage to the hotplate. On the other hand, our original spin coater allows for continuous spin coating and heat treatment on the substrate stage within the spin coater itself, without transferring the substrate to another hotplate. This capability enables us to explore conditions for more efficient preparation of perovskite layers. Particularly, we are focusing on anti-solvent-free methods for preparing the perovskite layer. We are investigating conditions for anti-solvent-free coating.

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