Presentation Information

[18p-P09-44]Study of ITO deposition for Perovskite/Si tandem solar cells

〇Rin Kawanabe1, Ryotaro Fujita1, Yudai Kikuchi1, Keito Hisatsune1, Shinsuke Miyajima2, Takurou Murakami3, Atsushi Kogo3, Shiro Uchida1 (1.Chiba Inst., 2.Tokyo Tech., 3.AIST)
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Keywords:

perovskite solar cell,transparent conductive oxide

Low-resistivity ITO film deposition by a low-temperature process is necessary to allow light to enter the perovskite/Si tandem solar cell from the hole transport layer side; for ITO film deposition, we aimed for resistivity 1×10-3 Ωcm or below and transmittance 80% or above without annealing by adjusting the oxygen flow rate during film deposition. The ITO film with an oxygen flow rate ratio of 3.0% showed a minimum resistivity of 4.72×10-4 Ωcm and an average transmittance of 87% in the visible light region.

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