[19a-A23-1~5] Advancements in Junction Technologies and Cutting-Edge Si-LSIs: Past, Present, and Future

10:25 AM - 11:10 AM JST(1:25 AM - 2:10 AM UTC)

[19a-A23-4] Activation and Deactivation of High-Concentration Dopant in Silicon Crystals

〇Ichiro Mizushima¹ (1.NuFlare Technology)

Keywords:

silicon,doping,activation

Activation and deactivation of high-concentration dopant in silicon crystals depend not only on the dopant species but also on the doping method. In this presentation, behavior of activation and deactivation process of highly doped arsenic or boron will be shown, investigated by various methods. Formation of different clusters depending on the dopant species and the doping method is the cause of the different activation and deactivation behaviors.