Session Details

[19a-A23-1~5]Advancements in Junction Technologies and Cutting-Edge Si-LSIs: Past, Present, and Future

Thu. Sep 19, 2024 9:00 AM - 11:55 AM JST
Thu. Sep 19, 2024 12:00 AM - 2:55 AM UTC
A23 (TOKI MESSE 2F)
Kazuo Tsutsui(Tokyo Tech), Bunji Mizuno(UJTLab)

[19a-A23-1]Opening

〇Satoshi Shibata1 (1.Panasonic)

[19a-A23-2]Progress of junction technology and semiconductor device

〇Hiroshi Iwai1 (1.NYCU)

[19a-A23-3]Junction Technologies in Advanced Logic LSIs

〇Hitoshi Wakabayashi1 (1.IIR, Tokyo Tech)

[19a-A23-4]Activation and Deactivation of High-Concentration Dopant in Silicon Crystals

〇Ichiro Mizushima1 (1.NuFlare Technology)

[19a-A23-5]History of Ion Implantation and Plasma Doping Technology, Its Present Status, Problems

〇Masayasu Tanjo1 (1.Retired Nissin Ion)