[19a-A23-1~5] Advancements in Junction Technologies and Cutting-Edge Si-LSIs: Past, Present, and Future

11:10 AM - 11:55 AM JST(2:10 AM - 2:55 AM UTC)

[19a-A23-5] History of Ion Implantation and Plasma Doping Technology, Its Present Status, Problems

〇Masayasu Tanjo¹ (1.Retired Nissin Ion)

Keywords:

Doping,Ion Implantation

Ion implantation and plasma doping technologies, which support semiconductor IC technology in terms of production, have contributed to the practical application of ICs. However, with the current trend toward miniaturization down to 2 nm line widths, it is said that the path taken so far has reached its limits. We would like to review the history of this technology and discuss its problems and future direction.