[19a-A31-1~11] 17.3 Layered materials

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[19a-A31-1] 【Absent】Coating of MoS₂ precursor / catalyst solutions on Si substrate for selective CVD growth

〇(M1)Ryunosuke Nishimura¹, Watanabe Kentaro^1,2 (1.Shinshu Univ., 2.IFES, ICCER, Shinshu Univ.)

Keywords:

MoS2,CVD,Selective Growth