[19a-A36-1~7] 8.3 Plasma nanotechnology

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[19a-A36-1] Low-temperature growth at 225 °C and characterization of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition

Quang Minh Ngo¹, Van Nong Ngo², Osamu Oda², 〇Kenji Ishikawa², Masaru Hori² (1.Nagoya Univ., 2.Nagoya Plasma)

Keywords:

Nanocarbon,Carbon nanowall,Plasma-enhanced chemical vaper deposition (CVD)

Carbon nanowalls with a structure of vertically aligned graphene sheets were grown in two steps: a highly vertical wall with an average wall spacing of 100 to 200 nm was formed, followed by a wall with a high wall density and an average wall spacing of approximately 20 nm. The combination of these two techniques produced carbon nanowalls grown in two steps, resulting in a unique structure with large and small walls and multi-branched walls. The effect of temperature on the growth process is also discussed.