Presentation Information

[19p-A31-12]Evaluation of Nb Impurity Uniformity in Monolayer MoS2 Transfer Film Using ToF-SIMS

〇Itsuki Tanaka1, Tomonori Nishimura1, Kaito Kanahashi1, Keiji Ueno2, Kosuke Nagashio1 (1.UTokyo, 2.Saitama Univ.)

Keywords:

two-dimensional material,semiconductor,SIMS

Impurity uniformity in monolayer transfer flakes of Nb-doped MoS2 synthesized by CVT was evaluated by ToF-SIMS; one flake contained uniform Nb, but there were differences in Nb concentration between flakes.

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