[19p-B3-1~22] 6.2 Carbon-based thin films

1:00 PM - 1:15 PM JST(4:00 AM - 4:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[19p-B3-1] Effect of Interval Cooling on Hydrogen-Free DLC Film during its Preparation by Vacuum Arc Deposition

〇Seiya Watanabe¹, Genki Sano¹, Mirano Oneda¹, Hirofumi Takikawa¹, Hiroaki Sugita², Takahiro Hattori², Hiroki Gima² (1.Toyohashi Univ. Technol., 2.OSG Co., Ltd.)

Keywords:

DLC,Vacuum arc deposition system,High rate deposition

The ta-C film has high thermal stability and high hardness and is used as a protective film for cutting tools and sliding parts. The vacuum arc deposition (VAD) method is mainly used for the deposition of ta-C films. We are developing VAD equipment for high-rate deposition. The equipment's highly efficient plasma transport specifications also entailed the problem of the risk of increased substrate temperatures. This results in the deposited film being an a-C film, which has a low hardness. Therefore, a cooling interval during the deposition process was tested.