Presentation Information

[19p-B3-18]Effect of Oxygen Terminal Surface Adsorption Layer on Energy Dissipation in Single-Crystal Diamond MEMS

〇Keyun Gu1,2, Zilong Zhang3, Wen Zhao1, Guo Chen1, Jian Huang2, Satoshi Koizumi1, Yasuo Koide1, Meiyong Liao1 (1.National Institute for Materials Science, 2.Shanghai University, 3.Tohoko University)

Keywords:

Diamond MEMS

Single-crystal diamond (SCD) presents as a promising candidate for the achievement of low mechanical dissipation or high quality (Q) factors for high-sensitivity and high signal-to-noise (SNR) ratio microelectromechanical systems (MEMS) sensors by virtue of its outstanding mechanical characteristic, high thermal conductivity, excellent electronic properties, and the characteristics of non-grain boundary and non-impurity phase [1-3]. The SCD MEMS resonators were fabricated by Ion implantation-assisted smart-cut technique [4,5]. The effect of the ion-irradiation induced defective layer has been minimized and the Q factor has been achieved over one million through atomic etching [6]. Nevertheless, how the surface terminal adsorption characteristics of diamond affects the Q factors of SCD MEMS is still mysterious. Therefore, the clarification of the oxygen-termination effect is critical to achieve the ultra-high Q factor MEMS resonators.
In this work, we clarify the effect of oxygen terminal surface adsorption characteristic on the resonance behavior of SCD MEMS resonator. We examine the Q factors and resonance frequencies of the SCD MEMS resonators with the defective layer removed in a high vacuum chamber by in-situ heating and cooling. Based on ultrahigh stability of resonance characteristic of SCD resonator at room temperature (RT) and high temperature (from 313 K to 933 K), the Q factors are significantly improved after heating processing. The Q factor of the 80 μm-long cantilever is improved from 1.0x105 to 1.2x105 and the resonance frequency increases, as shown in Fig.1. We clarify that the desorption of the absorbates on the oxygen-terminated diamond surface induces the lower surface energy dissipation and higher Q factor. Hence, appropriate surface treatments are necessary for the development of MEMS devices with low energy dissipation and high sensitivity.

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