Presentation Information
[19p-B3-2]Discharge Sustaining in High-Rate Filtered Arc Deposition for Coating of Hydrogen-Free Hard DLC Film
〇Genki Sano1, Seiya Watanabe1, Mirano Oneda1, Hirofumi Takikawa1, Hiroaki Sugita2, Takahiro Hattori2, Hiroki Gima2 (1.Toyohashi Univ. Technol., 2.OSG Co., Ltd.)
Keywords:
Diamond-Like Carbon,Vacuum Arc Deposition,Discharge Sustaining
We are developing a high rate-FAD (HR-FAD) with a coiled anode that generates a self-magnetic field for efficient plasma transport. However, when graphite cathodes were used, the total process time increased due to frequent self-extinction. We considered that this was caused by an increase in arc voltage due to an increase in the distance between the anode and the plasma beam. In this study, we conducted deposition tests by changing the anode aperture. It was confirmed that changing the anode aperture reduced the arc voltage and the number of self-extinctions.
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