Presentation Information

[19p-B5-2]Suppression of crack propagation in strained SiGe /Ge on Si(111) by selective ion implantation

〇Ryota Mizoguchi1, Masaki Nagao1, Yuka Shibahara1, Mayu Aikawa1, Michihiro Yamada1, Kohei Hamaya2,3, Kentarou Sawano1 (1.Tokyo City Univ., 2.CSRN, Osaka Univ., 3.OTRI, Osaka Univ.)
PDF DownloadDownload PDF

Keywords:

SiGe


Comment

To browse or post comments, you must log in.Log in