Presentation Information
[19p-B5-2]Suppression of crack propagation in strained SiGe /Ge on Si(111) by selective ion implantation
〇Ryota Mizoguchi1, Masaki Nagao1, Yuka Shibahara1, Mayu Aikawa1, Michihiro Yamada1, Kohei Hamaya2,3, Kentarou Sawano1 (1.Tokyo City Univ., 2.CSRN, Osaka Univ., 3.OTRI, Osaka Univ.)
Keywords:
SiGe
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