Presentation Information
[19p-C41-9]Investigation of color centers at SiO2/SiC interfaces formed by various oxidation temperatures
〇(B)Yu Kaneko1, Takato Nakanuma1, Haruko Toyama2, Kosuke Tahara2, Katsuhiro Kutsuki2, Heiji Watanabe1, Takuma Kobayashi1 (1.Osaka Univ., 2.Toyota Central R&D Labs., Inc.)
Keywords:
SiC,Single photon source,MOS interface
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