[19p-P02-1~13] 8.1 Plasma production and diagnostics

[19p-P02-13] Ion energy distribution function for multi-component ions in deep oscillation magnetron sputtering using a reflectron time-of-flight mass spectrometer

〇Hiroki Kobayashi¹, Yuuki Nakagawa¹, Eisuke Yokoyama¹, Nobuo Nishimiya¹, Masaomi Sanekata¹, Masahide Tona², Hiroaki Yamamoto², Keizo Tsukamoto², Kiyokazu Fuke³, Keijiro Ohshima⁴, Fuminori Misaizu⁴ (1.Tokyo Polytech Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)

Keywords:

time-of-flight mass spectrometry,magnetron sputtering,Ion energy distribution function

Recently, deep oscillation magnetron sputtering (DOMS) using comb-shaped power waveforms has attracted attention as the next generation of modulated pulsed power magnetron sputtering (MPPMS) with excellent arcing suppression performance despite high power long pulse power input. Currently, DOMS research is concentrating on deposition characteristics, and a detailed investigation of the DOMS plasma process is forthcoming. In this study, we developed a simultaneous multi-component ion measurement system for ions of DOMS measured by time-of-flight mass spectrometry (TOF-MS) to clarify the time evolution process and energy characteristics of DOMS. Time evolution measurement and ion energy distribution measurement were performed on multi-component ion particles. In the energy distribution measurement at the fourth peak of the Ar⁺ ions, low-energy peaks below 10 eV were observed for all components. On the other hand, for the ion species other than Ti⁺, peaks of high-energy peak above 10 eV were observed. The relation to time evolution and ion energy in DOMS plasma will be discussed from the results of ion energy distribution function (IEDF) at the peak of ions.