[19p-P03-1~5] 8.3 Plasma nanotechnology

[19p-P03-3] Effect of deposition time on the microstructure of SiO:CH particulate films deposited by CVD method

Riku Komazaki¹, 〇Mayuki Nisio¹, Yasushi Inoue¹, Osamu Takai² (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)

Keywords:

plasma CVD,Silica with organic groups,Vinyltrimethylsilane

Organic group-containing silica (SiO:CH) thin films have attracted much attention in recent years because of their low dielectric properties, gas barrier properties, and hydrophobicity. The objective of this study was to investigate the effect of varying the deposition time on SiO:CH particulate thin films, and found that the particle size and fusion ratio increased almost linearly with increasing deposition time up to 25 min, but both decreased sharply after 30 min and showed no correlation with deposition time.