Session Details
[19p-P03-1~5]8.3 Plasma nanotechnology
Thu. Sep 19, 2024 1:30 PM - 3:30 PM JST
Thu. Sep 19, 2024 4:30 AM - 6:30 AM UTC
Thu. Sep 19, 2024 4:30 AM - 6:30 AM UTC
P03 (Exhibition Hall A)
[19p-P03-1]Effect of Plasma Density to Functionalize Isocyanate Groups on Multi-walled Carbon Nanotubes
〇(M1)Kakuto Watanabe1, Keiji Nakamura1, Daisuke Ogawa1 (1.Chubu Univ.)
[19p-P03-2]Optical characterization of microstructured Cu2O and CuO thin films prepared by glancing-angle reactive sputtering
〇Yamato Sakamoto1, Yasushi Inoue1, Osamu Takai2 (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)
[19p-P03-3]Effect of deposition time on the microstructure of SiO:CH particulate films deposited by CVD method
Riku Komazaki1, 〇Mayuki Nisio1, Yasushi Inoue1, Osamu Takai2 (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)
[19p-P03-4]Nano-property control of GeSn thin films by RF sputtering and their application to Li ion batteries anode
〇Reon Yokoi1, Masayuki Ishihara1, Tomoki Omae1, Tomohisa nakada1, Ryoto Niwa1, Giichiro Uchida1 (1.Meijo Univ.)
[19p-P03-5]Deposition of sputtered GeSi composite nanoparticle films and their application to Li ion batteries anode
〇Tomohisa Nakada1, Masayuki Ishihara1, Tomoki Omae1, Ryoto Niwa1, Reon Yokoi1, Giichiro Uchida1 (1.Meijo Univ.)