[19p-P05-1~33] 21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" (Poster)

[19p-P05-24] Evaluation for thickness dependence of lattice parameter in polycrystalline In₂O₃ thin films induced by solid phase crystallization process

〇Tomoaki Ohno¹, Takanori Takahashi¹, Yuto Kawato¹, Hikaru Hoshikawa¹, Yukiharu Uraoka¹ (1.NAIST)

Keywords:

oxide semiconductor,indium oxide,solid phase crystallization process