[19p-P05-1~33] 21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" (Poster)

[19p-P05-31] Deposition of crystalline IGZO using high-power impulse magnetron sputtering

〇Taketo Nagata¹, Kazuya Ota², Kosuke Takenaka², Yuichi Setsuhara², Takayuki Ohta¹ (1.Meijo Univ., 2.Osaka Univ.)

Keywords:

High-power impulse magnetron sputtering,Crystalline IGZO,Oxide semiconductor