Presentation Information
[19p-P05-31]Deposition of crystalline IGZO using high-power impulse magnetron sputtering
〇Taketo Nagata1, Kazuya Ota2, Kosuke Takenaka2, Yuichi Setsuhara2, Takayuki Ohta1 (1.Meijo Univ., 2.Osaka Univ.)
Keywords:
High-power impulse magnetron sputtering,Crystalline IGZO,Oxide semiconductor
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