[19p-P05-1~33] 21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" (Poster)

[19p-P05-5] Dependence of Hydrochloric Acid Concentration Adding to Source in Mist CVD Growth of In₂O₃ Films on α-Al₂O₃ and Amorphous SiO₂

〇(M1)Ryo Ishikawa¹, Takumi Yamamoto¹, Yuya Hayashi¹, Shinya Aikawa¹, Takeyoshi Onuma¹, Tohru Honda¹, Tomohiro Yamaguti¹ (1.Kogakuin Univ.)

Keywords:

semiconductor,In2O3,Mist CVD