Presentation Information
[19p-P05-5]Dependence of Hydrochloric Acid Concentration Adding to Source in Mist CVD Growth of In2O3 Films on α-Al2O3 and Amorphous SiO2
〇(M1)Ryo Ishikawa1, Takumi Yamamoto1, Yuya Hayashi1, Shinya Aikawa1, Takeyoshi Onuma1, Tohru Honda1, Tomohiro Yamaguti1 (1.Kogakuin Univ.)
Keywords:
semiconductor,In2O3,Mist CVD
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