[20a-A31-1~11] 17.3 Layered materials

11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[20a-A31-9] Development of a Spatially Selective Patterning Method for Janus TMDs

〇DINGKUN BI^1,2, Weizi Lu^1,2, Soma Aoki^1,2, Tianyishan Sun^1,2, Hiroto Ogura^1,2, Toshiaki Kato^1,2 (1.Grad. Sch. of Eng., Tohoku Univ., 2.AIMR, Tohoku Univ.)

Keywords:

Janus TMDs,Patterning

We developed a spatially selective patterning method for Janus TMDs. It was found that using conventional photolithography resulted in resist having a detrimental effect on the TMD surface, preventing adequate progression of the Janusization process. However, by using hexagonal boron nitride (h-BN) as a mask, it was revealed that h-BN acts as an effective mask for the Janusization reaction, thus enabling clear spatially selective patterning of Janus TMDs.