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[20p-A22-7]X-ray topographic characterization of β-Ga2O3 crystals grown by vertical Bridgman method

〇Hirotaka Yamaguchi1, Yukako Kato1, Takuya Igarashi2, Yuki Ueda2, Kimiyoshi Koshi2, Shinya Watanabe2, Shigenobu Yamakoshi2, Akito Kuramata2 (1.AIST, 2.Novel Crystal Technology, Inc.)
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Keywords:

wide-gap semiconductor,crystal growth,X-ray topography


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