Session Details

[20p-A22-1~13]21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Fri. Sep 20, 2024 1:00 PM - 4:30 PM JST
Fri. Sep 20, 2024 4:00 AM - 7:30 AM UTC
A22 (TOKI MESSE 2F)
Toshiyuki Kawaharamura(Kochi Univ. of Tech.)

[20p-A22-1][The 56th Young Scientist Presentation Award Speech] Characterization of temperature dependence of Schottky barrier height in Ni/β-Ga2O3 combined with XPS study on valence band structure of β-Ga2O3

〇Akihira Munakata1, Kohei Sasaki2, Kentaro Ema2, Yoshiaki Nakano1, Masaki Kobayashi1, Takuya Maeda1 (1.Univ. of Tokyo, 2.Novel Crystal Technology, Inc.)

[20p-A22-2]Exploring of Thin Film Growth and Lattice Matching of α-(In, Fe)2O3 and α-(In, Ga)2O3 on LiNbO3 Substrates

〇Kazuki Shimazoe1, Hiroyuki Nishinaka1 (1.Kyoto Inst. Tech.)

[20p-A22-3]Sn-Doped β-Ga2O3 Epitaxial Layer Grown by Liquid Phase Epitaxy

〇Zhijin Chen1, Hiroaki Tadokoro1, Taro Takakura1, Miyuki Miyamoto1, Susumu Innan1, Teruo Kamura1 (1.Mitsubishi Gas Chemical)

[20p-A22-4]Homo-epitaxial growth on the β-Ga2O3 (011) substrate by HVPE

〇Kentaro Ema1, Chia-Hung Lin1, Yuki Ueda1, Kohei Sasaki1, Akito Kuramata1 (1.NCT)

[20p-A22-5]Investigation of activation annealing condition of β-Ga2O3 HVPE epitaxial wafer

〇Lin ChiaHung1, Kengo Obayashi1, Tomoka Nishikawa1, Kentaro Ema1, Yoshihiro Yamashita1, Kohei Sasaki1, Akito Kuramata1 (1.NCT)

[20p-A22-6]Growth rate control of β-Ga2O3 crystal growth in OVPE method using thermodynamic calculations

〇TOMOHIRO SHIRAISHI1, IMANISHI MASAYUKI1, HOSOKAWA KEISUKE1, USAMI SHIGEYOSHI1, MORI YUSUKE1 (1.Osaka Univ.)

[20p-A22-7]X-ray topographic characterization of β-Ga2O3 crystals grown by vertical Bridgman method

〇Hirotaka Yamaguchi1, Yukako Kato1, Takuya Igarashi2, Yuki Ueda2, Kimiyoshi Koshi2, Shinya Watanabe2, Shigenobu Yamakoshi2, Akito Kuramata2 (1.AIST, 2.Novel Crystal Technology, Inc.)

[20p-A22-8]Demonstration of vertical power devices of (001) β-Ga2O3 grown by MOCVD

〇Kentaro Ema1, Kohei Sasaki1, Akito Kuramata1 (1.NCT)

[20p-A22-9]Study on NiO/β-Ga2O3 heterojunctions grown by MBE technique

〇Hirotaka Yamaguchi1, Hitoshi Tampo1, Takehiko Nagai1, Yoshiaki Nakata2, Kohei Sasaki2 (1.AIST, 2.Novel Crystal Technology, Inc.)

[20p-A22-10]Anomalous Carrier Profile and Its Mobility in β-Ga2O3 Induced by Chlorine-Based Dry Etching

〇Takafumi Kamimura1, Masataka Higashiwaki1,2 (1.NICT, 2.Osaka Metropolitan Univ.)

[20p-A22-11]Optical properties of selective-area-grown α-Ga2O3 on c-plane sapphire

〇Riena Jinno1, Sangmin Ji2, Natthajuks Pholsen1, Hideo Otsuki1, Satoshi Iwamoto1,2 (1.RCAST Univ. Tokyo, 2.IIS Univ. Tokyo)

[20p-A22-12]Fabrication of single-mode α-Ga2O3 waveguides and observation of the light propagation in the visible region

〇(M2)Koudai Iijima1, Hideo Otsuki1, Sangmin Ji2, Riena Jinno1,3, Susumu Fukatsu3, Satoshi Iwamoto1,2 (1.RCAST U-Tokyo, 2.IIS U-Tokyo, 3.Graduate School of Arts and Sciences U-tokyo)

[20p-A22-13]Design of photnic crystal nanobeam cavity in gallium oxide

〇Jewook Jeon1, Koudai Iijima1, Nao Harada1, Sangmin Ji2, Riena Jinno1, Satoshi Iwamoto1,2 (1.RCAST U-Tokyo, 2.IIS U-Tokyo)