Session Details

[16p-P06-1~6]13.2 Exploratory Materials, Physical Properties, Devices

Mon. Sep 16, 2024 1:30 PM - 3:30 PM JST
Mon. Sep 16, 2024 4:30 AM - 6:30 AM UTC
P06 (Exhibition Hall A)

[16p-P06-1]Investigation of single crystallization mechanism of φ50mm size Mg2Si crystals

〇Zenji Fujihisa1, Yusei Kimura1, Kosuke Shimano1, Shunya Sakane1, Xin Liu2, Noritaka Usami2, Haruhiko Udono1 (1.Ibaraki Univ., 2.Nagoya Univ.)
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[16p-P06-2]Effects of Sputtering and Annealing Conditions on Oxygen Content in Mg2Si Thin Films

〇Keisuke Asano1, Katsumata Hiroshi1 (1.Meiji Univ.)
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[16p-P06-3]Effect of carrier density in n-Mg2Si substrate on the output characteristics of Mg2Si TPV cells fabricated by thermal diffusion

〇Takumi Shimizu1, Kosuke Shimano1, Sakane Shunya1, Udono Haruhiko1 (1.Ibaraki Univ.)
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[16p-P06-4]Reduction of cracks in BaSi2 films on p-type Si(100) substrates

〇Takumi Ishikawa1, Katsushi Nishino1 (1.Tokushima Univ.)
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[16p-P06-5]Growth of thicker BaSi2 films on n-type Si substrates by vacuum evaporation

〇Keiko Tsutsui1, Katsushi Nishino1 (1.Tokushima Univ.)
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[16p-P06-6]Comparison of I-V characteristics of Low Threshold SBDs Using Japanese and Spanish FeS2 Natural Crystals

〇Riku Ando1, Gaku Kamio1, Ren Morita1, Hiroshi Fujioka2, Narihiko Maeda1 (1.Tokyo Univ. of Technology, 2.Inst. of Industrial Science, Univ. of Tokyo)
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