Presentation Information
[22a-12G-9]Production of Discharge Plasma during Diffusion of Pulse Injected Gas
〇Akimitsu Hatta1, Ryusuke Hashida1 (1.Kochi Univ. Technol.)
Keywords:
gas discharge,pulse discharge,gas diffusion
Control of plasma process using gas discharge is comprised of the apparatus/container system, the power supply system, and the gas supply system. The gas supply is an important element in reaction process control. Since the behavior of gases is controlled only by the diffusion process, there are limited methods for intentionally controlling gases temporally and spatially. In this research, we will generate discharge plasma in a state where the gas is spatially unevenly distributed during the diffusion of the gas supplied by pulses injection until it becomes uniformly distributed at equilibrium pressure. The properties of pulse injected gas discharge plasma are investigated and the characteristics will be applied to new plasma processes.